Principal Scientist (Optics and Lithography) (APM), IME

Job Responsibilities

• Leading central lithography team under pattern transfer group.
  
  
• Selection, procurement and qualification of litho tool sets based on program -- from contact aligner to immersion.
  
  
• Actively working with cross functional stake owners to plan and develop new lithography process.
  
  
• Validate design, reticle tap out and post tap out verification.
  
  
• Assist in internal and external technical discussion to overcome process related challenge and provide relevant solution.
  
  
• Perform process characterization, margin study to determine the process capability of new process platform.
  
  
• Act as a subject matter expert and resource for researchers and industry partners to enable process and/or product realization.
  
  
• Publish process development outcome and breakthrough in research community.
  
  
• Engage with relevant equipment makers/vendors and responsible for selecting and procuring research equipment.
  
  
• Work with fab team in establishing SPC for newly developed process.
  
  
• Act as a resource for colleagues with less experience; lead small projects with manageable risks.
  
  
• Accelerate parallel process development capability to meet aggressive project timelines and supporting faster innovation cycles.
  
  
• Build a sustainable talent pipeline across both research and engineering levels.
  
  

Job Requirements:

• PhD/ Master Degree in Materials Science, Electrical Engineering, Chemical Engineering, Physics, Chemistry, and Microelectronics, or closely related fields are welcome to apply.
  
  
• More than 10 years relevant working experiences in R&D and/or industry environment with broad exposure in handling 6”, 8” and/or 12” substrate covering nano to micron tech nodes, preferably experiences in SiC/GaN/Photonics.
  
  
• Proficient in Photolithography tools including Immersion/KrF/I-line Scanner/Stepper/Mask Aligner, knowledge in EBEAM Lithography tool will be added advantage.
  
  
• Hands-on experiences in metrology including but not limited to CDSEM, Overlay, OCD, DRSEM, Microscope.
  
  Capable to create recipe to support various research requirement.
  
  
• Knowledge in design and simulation (Prolith, OPC, etc), reticle layout (oas, gds) review and basic tap out process.
  
  
• Equip with Lithography skills set including fundamental Lithography theory, Photoresist characteristic and application, new process setup (swing curve, FEM, DOE, statistical root cause analysis and problem-solving methods, etc), optimization and margin improvement.